作者：Smirnova, T.P.;Lebedev, M.S.;Morozova, N.B.;Semyannikov, P.P.;Zherikova, K.V.;Kaichev, V.V.;Dubinin, Y.V.;

作者单位：Nikolaev Institute of Inorganic Chemistry of Siberian, Branch of Russian Academy of Science 3, Acad. Lavrentieva Pr., Novosibirsk, 630090, Russian Federation;Nikolaev Institute of Inorganic Chemistry of Siberian, Branch of Russian Academy of Science 3, Ac

刊名：Chemical vapor deposition

ISSN：0948-1907

出版年：2010-01-05

卷：16

期：41005

起页：185

止页：190

分类号：TQ175

语种：英文

关键词：Hafnium aluminate;Hafnium dioxide;High-k dielectric;Thin films;XPS;

内容简介

Investigation of the thermal behavior of Hf(dpm)4 vapor in vacuum is carried out. An approach for obtaining films of (HfO) _x_2O_3)_(1-x) alloys is developed. The use of a source containing a mixture of two precursors differing from each other in volatility, notably Hf(dpm)4 (dpm~-dipivaloylmethanate, 2,2,6,6-tetramethylheptane-3,5-dionate) and Al(acac)3 (acac~-pentane- 2,4-dionate), allows us to employ the possibilities of combinatorial chemistry, and to obtain and analyze a number of different compositions of alloys. Film characterization is performed using a set of analytical methods. The character of Al and Hf distributions across the film thickness, depending on their content in the source, is investigated. The use of laser null ellipsometry allows us to determine the distribution of the refractive index across the thickness of the (HfO) _(x2)O_3)_(1-x) film. A comparison of the ellipsometric data with the X-ray photoelectron spectroscopy (XPS) data shows that the character of the refractive index variation reproduces the variation of the chemical composition across the film thickness.Auniform distribution of the elements across the film thickness is observed in the cases when separated sources are used. The structure of the film depends on the molar fraction of Al_2O_3 in alloys. For Al≥30 at.-% amorphization of the structure occurs.