作者：Beardslee, J.A.;Mebust, A.K.;Chaimowitz, A.S.;Davis-Vanatta, C.R.;Moersch, T.L.;Afridi, M.Y.;Taylor, C.J.;Leonard, H.;

作者单位：Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Po

刊名：Chemical vapor deposition

ISSN：0948-1907

出版年：2010-01-05

卷：16

期：41099

起页：206

止页：210

分类号：TQ175

语种：英文

关键词：

内容简介

Two single source precursors for vanadium oxide (vanadium oxytripropoxide, VO(OC_3H_7)_3 and vanadium oxytrinitrate, VO(NO_3)_3) are used to prepare selective chemical sensors. Sensors demonstrate reduced sensitivity to compounds formed during their preparation. X-ray diffraction and electron microscopy studies suggest that this selectivity is likely due to preferred orientation resulting from differences in the molecular structures of the single source precursors u sed for preparing the vanadium oxide.