作者:TOSHIYUKI NISHIMURA;XIN XU;NAOTO HIROSAKI;
作者单位:National Institute for Materials Science
刊名:Journal of the Technical Association of Refractories
ISSN:0285-0028
出版年:2007-01-05
卷:27
期:2
起页:141
止页:0
分类号:TQ175
语种:英文
关键词:
内容简介Silicon nitride (Si_3N_4) ceramics are expected to be useful as high-temperature structural materials because of their high creep resistance. Plasticity of small grain size silicon nitride ceramics is already known at temperature lower than the sintering temperture. Recently, surprising improvement in properties is expected through development of nanometer scale microstructure by nano-technology. This paper reports fabrication of silicon nitride ceramics with nanometer scale grain size and the measurement of compressive deformation to improve plasticity.
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