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A novel approach to silicon-nanowire-assisted growth of high-purity, single-crystalline beta-Si3N4 nanowires

作者:Niu, JJ;Wang, JN;

作者单位:Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Shanghai 200030, Peoples R China

刊名:Chemical vapor deposition

ISSN:0948-1907

出版年:2007-01-05

卷:13

期:8

起页:396

止页:400

分类号:TQ175

语种:英文

关键词:crystal growth;high purity;Si3N4 nanowires;NITRIDE NANOWIRES;CARBOTHERMAL REDUCTION;ALPHA-SI3N4;SI3N4;WHISKERS;FIBERS;EVAPORATION;NANOCABLES;SCATTERING;RAMAN;

内容简介

Bundles of single-crystalline beta-Si3N4 nanowires with high purity are successfully synthesized using a simple CVD process with silicon nanowire(SiNW)-assisted growth. The beta-Si3N4 NWs obtained have a small diameter of similar to 30 nm, a single-crystalline structure with [100] or [101] direction, and a thin oxide shell. The photoluminescence and Raman scattering spectra confirm the good crystalline structure. The weak blue-shift of the peaks in Raman scattering compared to bulk beta-Si3N4 is attributed to the phonon confinement effect or laser heating during the measurements. Finally, a possible SiNWs template-assisted growth model is suggested.

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