作者：AKITAKA IKEBUCHI;

作者单位：Research Center, Shinagawa Refractories Co., Ltd

刊名：Journal of the Technical Association of Refractories

ISSN：0285-0028

出版年：2006-01-05

卷：26

期：4

起页：273

止页：278

分类号：TQ175

语种：英文

关键词：

内容简介

For the past few years, there has been a significant increase of interest in intellectual property rights, both in Japan and worldwide. Consequently it is the intent of the author to review the patent system in Japan, on the basis of the Japan Patent Laws. The point must be emphasized that the patent laws discussed in this paper do not refer to any other country. Because the patent system is different in each country, the readers may find it interesting to compare the patent system in their own country with Japan. The author is also hopeful that this information might help some readers to apply for a patent in Japan. This paper is compiled from the textbook which called "Heisei 17 nendo Chitekizaisanseido Setsumeikai (Shoshinsha-muke) Tekisuto", published by the Japan Patent Office (JPO), which regrettably is available only in Japanese. The English homepage of JPO is introduced at the end of the paper, as a reference that contains various details.