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Scanning Electron Microscope

作者:KAZUMICHI OGURA;

作者单位:Application Center, JEOL Ltd. 3-2-1, Musashino, Akishima-shi, Tokyo 196-8558

刊名:Journal of the Technical Association of Refractories

ISSN:0285-0028

出版年:2003-01-05

卷:23

期:2

起页:100

止页:102

分类号:TQ175

语种:英文

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内容简介

We introduced a low vacuum SEM that uses backscattered electrons for imaging and demonstrated its efficacy in the analysis of insulating materials such as refractories that are difficult to outgas. An actual LV-SEM unit can detect not only backscattered electrons but also signals as clear as secondary electron images to be obtained with a high vacuum SEM. Understanding their characteristics will permit us to use those signals for certain purposes. In the test analysis presented in this paper, the compositional image produced by the backscattered electrons agreed well with the element map generated with an EDS. This demonstrated the efficacy of the low vacuum SEM that uses backscattered electrons for imaging. Although we did not get into the subject of specimen preparation in this paper, proper pretreatment of a specimen allows us to observe and analyze it in both high and low vacuum modes. Comparison of the results obtained in the two modes may be able to give us new insight into the specimen.

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