作者：Philip WALLS

作者单位：Hitech Materials Pty Ltd

会议录名称：Conference on Refractories International 2018

出版年：2018-10-17

起页：1

止页：1

总页数：1

馆藏号：

分类号：TQ175

语种：英文

会议名称：Conference on Refractories International 2018

会议地点：中国浙江杭州

会议时间：2018-10-17

会议主办者：中钢集团洛阳耐火材料研究院,中国金属学会耐火材料分会,耐火材料杂志社,先进耐火材料国家重点实验室

关键词：

内容简介

Recent developments in imaging techniques for both microfocus X-ray Fluoresence (micro-XRF) element mapping and Cathodoluminescence (CL) microscopy will be presented. Use of these tools assists refractory manufacturers and researchers to analyse compositional variations across large areas of cast or preformed refractory components. The analysis area with micro-XRF is only limited by the size of the scanning system and currently areas of 0.3 x 0.5m can be scanned with spot sizes of 5碌m. With CL imaging differences in trace elements and atom neighbourhood provide contrast in the emitted CL colour, allowing penetration by molten aluminium into alumina containing refractories to be visualised. Examples of monitoring refractory quality issues related to raw material inhomogeneity and melt interaction/corrosion zones in refractories will be shown and discussed.