作者:Pietro Mandracci;Paola Ceruti;Carlo Ricciardi;Federico Mussano;Stefano Carossa;
作者单位:Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali e Microsistemi), Politecnico di Torino Corso Duca degli Abruzzi 24, I-10129, Torino (Italy);Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali
刊名:Chemical vapor deposition
ISSN:0948-1907
出版年:2010-01-05
卷:16
期:40911
起页:29
止页:34
分类号:TQ175
语种:英文
关键词:biomaterials;cytotoxicity;dental materials;EDX;PECVD;silicon oxide;
内容简介Silicon-oxygen amorphous thin film alloys (a-SiOx) are grown at room temperature by plasma-enhanced (PE)CVD on two dental materials; a ceramic and a microcomposite resin.Acompositional analysis of substrates and films is performed by energy dispersive X-ray spectroscopy (EDX), while the sample morphologies are investigated by optical microscopy. Some preliminary investigations on the interaction of substrates and coatings with cells give indications in favor of a-SiOx biocompatibility, and show that the application of coatings based on this material may have a good potential for the reduction of cytotoxicity in dental materials.
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