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- Lancs and North West Branch News
David A Jarvis.;TQ175.7The Refractories Engineer英文2009-01-05
- UK Conference Report--rOTHERHAM, 30th September 2009
TQ175.7The Refractories Engineer英文2009-01-05
- The End User and the Challenges Experienced by Furnaces in Industry
Jan Soonius;TQ175.7The Refractories Engineer英文2009-01-05
- Executive Chairman and General Secretary's Report to Annual General Meeting, 2008/9
Paul Bottomley;Alan Hey;TQ175.7The Refractories Engineer英文2009-01-05
- CERAM Provides Guidelines
TQ175.7The Refractories Engineer英文2009-01-05
- Taking our Institute Forward after the Challenges of the Global Recession
Trevor Staton;TQ175.7The Refractories Engineer英文2009-01-05
- Reclaimed Raw Material Resources
Tony Hutton;TQ175.7The Refractories Engineer英文2009-01-05
- Special Refractories Solutions
TQ175.7The Refractories Engineer英文2009-01-05
- First Order for New Maintenance Workshop in China
TQ175.7The Refractories Engineer英文2009-01-05
- Development of Tundish Dry Vibe Technology
TQ175.7The Refractories Engineer英文2009-01-05
- Large-Scale Synthesis of Few-Layered Graphene using CVD
Tian, R;Yu, ZY;Xiang, D;Cheng, J;Wang, XB;You, HJ;Liu, FM;Li, MJ;Wan, L;Li, SQ;Li, Q;Xu, Y;TQ175Few-layered graphene;Nanostructures;Hubei Univ, Fac Mat Sci & Engn, Wuhan 430062, Peoples R China.;Hubei Univ, Fac Mat Sci & Engn, Wuhan 430062, Peoples R China.;Hubei Univ, Fac Mat Sci & Engn, Wuhan 430062, Peoples R China.;Cent China Normal Univ, Coll Chem, Key Lab Pesticide & Chem Biol EChemical vapor deposition英文2009-01-05
- Growth Mechanism and Chemical Structure of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 1
Wrobel, AM;Walkiewicz-Pietrzykowska, A;Ahola, M;Vayrynen, IJ;Ferrer-Fernandez, FJ;Gonzalez-Elipe, AR;TQ175film composition;film structure;RHP-CVD;silicon carbide film;triethylsilane precursors;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.;Univ Turku, Dept Phys, FIN-20014 Turku, Finland.;Univ Turku, Dept Phys, FIN-20014 Turku, Finland.;Ctr Nacl AceleradoresChemical vapor deposition英文2009-01-05
- The Aerosol-Assisted CVD of Silver Films from Single-Source Precursors
Panneerselvam, A;Malik, MA;O'Brien, P;Helliwell, M;TQ175AACVD;Silver;Thin films;Single-source precursors;Temperature gradient;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.;Univ Manchester, Sch Chem, Manchester M13 9PL, Lancs, England.Chemical vapor deposition英文2009-01-05
- Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
Rowlette, PC;Allen, CG;Bromley, OB;Dubetz, AE;Wolden, CA;TQ175atomic layer deposition (ALD);dimethyl zinc;plasma;zinc oxide;Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA.;Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA.;Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA.;Colorado Sch Mines, Dept Chem Engn, Golden, CO 80401 USA.;Colorado Sch Mines, Dept CheChemical vapor deposition英文2009-01-05
- Polymeric Coatings Deposited From an Aerosol-Assisted Non-thermal Plasma Jet
O'Neill, L;O'Sullivan, C;TQ175aerosol;fluorocarbon;plasma;polymer;surface energy;Dow Corning Plasma Solut, Cork, Ireland.;Dow Corning Plasma Solut, Cork, Ireland.Chemical vapor deposition英文2009-01-05
- ALD of YF3 Thin Films from TiF4 and Y(thd)(3) Precursors
Munnik, F;Leskela, M;Ritala, M;Pilvi, T;Puukilainen, E;TQ175ALD;Optical materials;Thin films;YF3;Inst Ion Beam Phys & Mat Res, Forschungszentrum Dresden Rossendorf, D-01314 Dresden, Germany.;Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland.;Univ Helsinki, Dept Chem, FIN-00014 Helsinki, Finland.;Univ Helsinki, Dept Chem, FIN-00014 Helsinki, FinlaChemical vapor deposition英文2009-01-05
- Properties of Amorphous Hydrogenated Silicon Carbide (a-SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 2
Walkiewicz-Pietrzykowska, A;Wrobel, AM;Glebocki, B;TQ175amorphous materials;density;hydrogenated silicon carbide films;mechanical properties;refractive index;surface morphology;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.;Polish Acad Sci, Ctr Mol & Macromol Studies, PL-90363 Lodz, Poland.Chemical vapor deposition英文2009-01-05
- Fabrication and Characteristics of Carbon Nanofiber-Reinforced Carbon/Carbon Composites by Fast Catalytic Infiltration Processes
Zhang, JC;Luo, RY;Wu, XW;Li, Q;TQ175carbon nanofibers;chemical vapor infiltration (CVI);fiber/matrix bond;hybrid multiscale composites;modeling;Beijing Univ Aeronaut & Astronaut, Coll Phys, Beijing 100083, Peoples R China.;Beijing Univ Aeronaut & Astronaut, Coll Phys, Beijing 100083, Peoples R China.;Beijing Univ Aeronaut & Astronaut, Coll Phys, Beijing 100083, Peoples R China.;Beijing Univ AeronChemical vapor deposition英文2009-01-05
- Improvement of Brick Deterioration Resistance in the Transition Zone of a Cement Rotary Kiln
TAMIATSU KOYAKE;MASAMICHI TAKAI;HIDENORI TADA;TQ175Okayama Works, Shinagawa Refractories Co., LTD. Urainbe 1188-1, Bizen City, Okayama 705-0002;Okayama Works, Shinagawa Refractories Co., LTD. Urainbe 1188-1, Bizen City, Okayama 705-0002;Okayama Works, Shinagawa Refractories Co., LTD. Urainbe 1188-1, BizenJournal of the Technical Association of Refractories英文2009-01-05
- Improvement in Refractory Life of a Cement Rotary Kiln by Mechanical Maintenance
KOZO TOKUNAGA;MAKOTO OHNO;EIICHI NAKAJIMA;TQ175Mino Ceramic Co., Ltd. 1-46, Kamezaki, Kitaura-cho, Handa-shi, Aichi 475-0027;Mino Ceramic Co., Ltd. 1-46, Kamezaki, Kitaura-cho, Handa-shi, Aichi 475-0027;Mino Ceramic Co., Ltd. 1-46, Kamezaki, Kitaura-cho, Handa-shi, Aichi 475-0027Journal of the Technical Association of Refractories英文2009-01-05