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- Sulfur- and Nitrogen-Doped Titania Biomaterials via APCVD
Charles W. Dunnill;Zoie A. Aiken,;Jonathan Pratten;Ivan P. Parkin;TQ175antimicrobial materials;doped titanium dioxide;thin films;visible light photocatalysts;biomaterials;Centre for Materials Research, Department of Chemistry, University College London;Centre for Materials Research, Department of Chemistry, University College London;Centre for Materials Research, Department of Chemistry, University College London;Centre foChemical vapor deposition英文2010-01-05
- Almatis Group Files Pre-packaged Chapter 11 Cases to Implement Agreed Financial Restructuring
TQ175.7The Refractories Engineer英文2010-01-05
- Atomic layer deposition of gadolinium aluminate using gd (~iprcp)_3, TMA, and O_3 or H_2O
Adelmann, C.;Pierreux, D.;Swerts, J.;Dewulf, D.;Hardy, A.;Tielens, H.;Franquet, A.;Brijs, B.;Moussa, A.;Conard, T.;Van Bael, M.K.;Maes, J.W.;Jurczak, M.;Kittl, J.A..;Van Elshocht, S.;TQ175ALD;Cyclopentadienyl;Gadolinium aluminate;Gadolinium oxide;High-k oxides;Kapeldreef 75, B-3001, Leuven, Belgium;Kapeldreef 75, B-3001, Leuven, Belgium;Kapeldreef 75, B-3001, Leuven, Belgium;Institute for Materials Research, Inorganic and Physical Chemistry, Hasselt University, B-3590, Diepenbeek, Belgium;Institute for MaterialChemical vapor deposition英文2010-01-05
- A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen-Donor Adducts of Dimethylzinc
Kate Black;Paul R. Chalker;Anthony C. Jones;Peter J. King;John L. Roberts;Peter N. Heys;TQ175dimethylzinc adducts;liquid injection MOCVD;ZnO nanowires;Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Chemical vapor deposition英文2010-01-05
- Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2
Anthony C. Jones;John Bacsa;Paul R. Chalker;Paul A. Marshall;Hywel O. Davies;Peter N. Heys;Paul O’Brien, Mohammad Afzaal;James Raftery;Gary W. Critchlow;Kate Black;TQ175MOCVD;Titanium 2;5-dimethylpyrrolyl complexes;Titanium dioxide;Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University Chemical vapor deposition英文2010-01-05
- Technology of Mechanization and Automation of Refractory Brick Manufacture
TAKESHI MATSUDA;MASAYA NAKASHIMA;TQ175Journal of the Technical Association of Refractories英文2010-01-05
- Mechanization of Refractory Repair Work with Centrifugal Force Shot Method (Rotary-Shot Method)
HIROSHI IMAGAWA;TADASHI IKEMOTO;KOJI KONO;TQ175Department of Inorganic Materials Research & Development, the Environment and Process Technology Center, the Technical Development Bureau, Nippon Steel Corporation;Department of Inorganic Materials Research & Development, the Environment and Process TechnJournal of the Technical Association of Refractories英文2010-01-05
- Korean Leader Won Over By Dragon
TQ175.7The Refractories Engineer英文2010-01-05
- PRESIDENT'S COLUMN
Peter Rooney;TQ175.7The Refractories Engineer英文2010-01-05
- Pyrotek product solutions and local support assist Portland smelter
TQ175.7The Refractories Engineer英文2010-01-05
- Resin Free Tundish Dry Mix at SSAB Lulea
Steinar Slagnes;Hakan Wahlberg;Odd Westeras;TQ175.7The Refractories Engineer英文2010-01-05
- a-SiOx Coatings Grown on Dental Materials by PECVD: Compositional Analysis and Preliminary Investigation of Biocompatibility Improvements
Pietro Mandracci;Paola Ceruti;Carlo Ricciardi;Federico Mussano;Stefano Carossa;TQ175biomaterials;cytotoxicity;dental materials;EDX;PECVD;silicon oxide;Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali e Microsistemi), Politecnico di Torino Corso Duca degli Abruzzi 24, I-10129, Torino (Italy);Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio MaterialiChemical vapor deposition英文2010-01-05
- Glass furnace refractory supply and developments - 'Interesting times'
Geoff Evans;TQ175.7The Refractories Engineer英文2010-01-05
- The Synthesis of Highly Loaded Cu/Al2O3 and Cu/ZnO/Al2O3 Catalysts by the Two-Step CVD of CuIIdiethylamino-2-propoxide in a Fluidized-Bed Reactor
Michael Becker;Raoul Naumann d‘Alnoncourt;Kevin Kahler;Jelena Sekulic;Roland A. Fischer;Martin Muhler;TQ175copper;fluidized-bed reactor;methanol synthesis;nanocomposites;two-step deposition;zinc oxide;Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Chemical vapor deposition英文2010-01-05
- Synthesis of gallium nitride nanoparticles by microwave plasma-enhanced CVD
Shimada, M.;Wang, W.-N.;Okuyama, K.;TQ175Gas-phase synthesis;III-V materials;Light-emitting diode;Monodispersed particles;Semiconductor;Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University 1-4-1, Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8527, Japan;Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University 1-4-1, KagamChemical vapor deposition英文2010-01-05
- Growth and characterization of ti-ta-o thin films on si substrates by liquid injection MOCVD for high-k applications from modified titanium and tantalum precursors
Devi, A.;Hellwig, M.;Barreca, D.;Parala, H.;Thomas, R.;Becker, H.-W.;Katiyar, R.S.;Fischer, R.A.;Tondello, E.;TQ175High-k oxides;LI-MOCVD;Precursor chemistry;Thin films;Ti-Ta-O;Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitátsstr. 150, D-44780, Bochum, Germany;Inorganic Materials Chemistry, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum Universitátsstr. 150, D-Chemical vapor deposition英文2010-01-05
- Almatis Group Receives Authority to Enter Into Plan Support Agreement and Execute Related Commtment Letters
TQ175.7 The Refractories Engineer英文2010-01-05
- ELECTRIC STEEL MAKERS GUILD
Miles Berry;TQ175.7The Refractories Engineer英文2010-01-05
- THE EDITOR SPEAKS OUT
John May;TQ175.7The Refractories Engineer英文2010-01-05
- Synthesis of wo_3 nanogranular thin films by hot-wire CVD
Houweling, Z.S.;Geus, J.W.;Schropp, R.E.I.;TQ175Amorphous;Crystalline;Rutherford backscattering spectrometry;Thin films;Tungsten oxide;Nanophotonics - Physics of Devices, Debye Institute of Nanomaterials Science, Utrecht University Princetonlaan 4, 3584 CB Utrecht, Netherlands;Electron Microscopy Utrecht, Utrecht University Padualaan 8, 3584 CH Utrecht, Netherlands;Nanophotonics - PhysicChemical vapor deposition英文2010-01-05