期刊检索结果
-
题目
作者
分类号
关键字
作者单位
刊名
语言
出版时间
- Investigation of atmospheric pressure CVD-produced aluminum coatings for the protection of steel from corrosion
Gu, S.;Maeng, S.;Suh, Y.;Levy, R.A.;Deavenport, D.L.;Gómez, F.J.;Newberg, S.S.;Brooman, E.W.;Berman, E.S.;Kleek, J.J.;Beatty, J.H.;Schwartz, A.S.;Gaydos, S.P.;TQ175Aluminum;APCVD;Corrosion protection;Step coverage;TIBAL;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 071Chemical vapor deposition英文2010-01-05
- In-situ bulk electrophoretic separation of single-walled carbon nanotubes grown by gas-phase catalytic hydrocarbon decomposition
Smovzh, D.V.;Maltsev, V.A.;Dittmer, S.;Zaikovsky, V.I.;Campbell, E.E.B.;Nerushev, O.A.;TQ175CNTs;Electrophoresis;Glow discharge;Hollow cathode;Plasma CVD;Institute of Thermophysics SB RAS, Prosp. Lavrentyev 1, 630090 Novosibirsk, Russian Federation;Institute of Thermophysics SB RAS, Prosp. Lavrentyev 1, 630090 Novosibirsk, Russian Federation;Department of Physics, G?teborg University, 41296 G?teborg, SwedeChemical vapor deposition英文2010-01-05
- Silicon carbonitride (SiCN) films by remote hydrogen microwave plasma CVD from tris(dimethylamino)silane as novel single-source precursor
Wrobel, A.M.;Blaszczyk-Lezak, I.;Uznanski, P.;Glebocki, B.;TQ175Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland;Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland;Centre of Molecular aChemical vapor deposition英文2010-01-05
- Using precursor chemistry to template vanadium oxide for chemical sensing
Beardslee, J.A.;Mebust, A.K.;Chaimowitz, A.S.;Davis-Vanatta, C.R.;Moersch, T.L.;Afridi, M.Y.;Taylor, C.J.;Leonard, H.;TQ175Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, PoChemical vapor deposition英文2010-01-05
- Growth of [100]-textured gadolinium nitride films by CVD
Brewer, J.R.;Gernhart, Z.;Liu, H.-Y.;Cheung, C.L.;TQ175Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0304, United States;School of Science, Buena Vista University, Storm Lake, IA 50588, United States;Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska Chemical vapor deposition英文2010-01-05
- Mass analysis of growth of AL _2O _3 thin films from low-temperature atomic layer deposition on woven cotton
Hojo, D.;Adschiri, T.;TQ175Aluminum oxide;Atomic layer deposition;Conformal coatings;Cotton;Three-dimensional structures;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, Japan;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, JapanChemical vapor deposition英文2010-01-05
- [cis-(1,3-diene) _2W(CO) _2] complexes as MOCVD precursors for the deposition of thin tungsten - Tungsten carbide films
Jipa, I.;Heinemann, F.W.;Schneider, A.;Popovska, N.;Siddiqi, M.A.;Siddiqui, R.A.;Atakan, B.;Marbach, H.;Papp, C.;Steinrück, H.-P.;Zenneck, U.;TQ175Diene complexes;MOCVD;Tungsten;Tungsten carbide;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM), Universit?t Erlangen-Nürnberg, Egerlandstrasse 1, D-91058 Erlangen, Germany;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM),Chemical vapor deposition英文2010-01-05
- Improved Additives for High Purity Reduced Cement Castable Systems
Christopher Parr;Genine Assis;Herve Fryda;TQ175原料專門委員会報告集英文2010-01-05
- Direct and Protein-Mediated Cell Attachment on Differently Terminated Nanocrystalline Diamond
Frederik Klauser;Martin Hermann;Doris Steinmuller-Nethl;Oliver Eiter;Alberto Pasquarelli;Erminald Bertel;Thomas Seppi;Peter Lukas;Thomas Lechleitner;TQ175cell adhesion;FBS;HF-CVD;NCD;protein adsorption;Department of Therapeutic Radiology and Oncology, Innsbruck Medical University Anichstr. 35, 6020 Innsbruck (Austria);Department of Therapeutic Radiology and Oncology, Innsbruck Medical University Anichstr. 35, 6020 Innsbruck (Austria);Department of TheraChemical vapor deposition英文2010-01-05
- Comparison of Coupling Methods for Linking Between Reactor and Feature Scales
Jonathan Jilesen;Fue-Sang Lien;TQ175Biomaterials;Calcium lactate;Hydroxyapatite;PP-MOCVD;Trimethyl phosphate;Department of Mechanical Engineering, University of Waterloo 200 University Avenue West, Waterloo, Ontario, N2L 2G1 (Canada);Department of Mechanical Engineering, University of Waterloo 200 University Avenue West, Waterloo, Ontario, N2L 2G1 (Canada)Chemical vapor deposition英文2010-01-05