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- Refractories Education and Training in a Changing Globalised Environment
TQ175.7The Refractories Engineer英文2010-01-05
- Manufacturing Critical To British Economy, Says Richard Caborn
TQ175.7The Refractories Engineer英文2010-01-05
- IPS Ceramics Announces Management Buyout of Dyson Group
TQ175.7The Refractories Engineer英文2010-01-05
- Anti-clogging nozzle refractories composed of calcium zirconatedicalcium silicate-carbon for application in steel industry
A.G.M. Othman;W.M.N. Nour;M.M.S. Wahsh;TQ175.7National Researche Centre, Refractories, Ceramics and Building materials Dept., Cairo, Egypt;National Researche Centre, Refractories, Ceramics and Building materials Dept., Cairo, Egypt;National Researche Centre, Refractories, Ceramics and Building materiThe Refractories Engineer英文2010-01-05
- Multifunctional nanocomposite thin films by aerosol-assisted CVD
Warwick, M.E.A.;Dunnill, C.W.;Binions, R.;TQ175AACVD;Nanocomposites;Thin films;Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London WC1H 0AJ, United Kingdom;Department of Chemistry, University College London, Christopher Ingold Laboratories, 20 Gordon Street, London WC1H 0AJ, Chemical vapor deposition英文2010-01-05
- Deposition of large-area and protective diamond-like carbon coatings on glass substrates by low-pressure dielectric barrier discharges
Niu, J.;Liu, D.;Ou, Y.;You, Y.;Yu, N.;TQ175Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, China;Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, China;Research Center for Optoelectronics, Dalian Nationalities University, DalChemical vapor deposition英文2010-01-05
- Investigation of atmospheric pressure CVD-produced aluminum coatings for the protection of steel from corrosion
Gu, S.;Maeng, S.;Suh, Y.;Levy, R.A.;Deavenport, D.L.;Gómez, F.J.;Newberg, S.S.;Brooman, E.W.;Berman, E.S.;Kleek, J.J.;Beatty, J.H.;Schwartz, A.S.;Gaydos, S.P.;TQ175Aluminum;APCVD;Corrosion protection;Step coverage;TIBAL;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 07102, United States;Department of Physics, New Jersey Institute of Technology, Newark, NJ 071Chemical vapor deposition英文2010-01-05
- In-situ bulk electrophoretic separation of single-walled carbon nanotubes grown by gas-phase catalytic hydrocarbon decomposition
Smovzh, D.V.;Maltsev, V.A.;Dittmer, S.;Zaikovsky, V.I.;Campbell, E.E.B.;Nerushev, O.A.;TQ175CNTs;Electrophoresis;Glow discharge;Hollow cathode;Plasma CVD;Institute of Thermophysics SB RAS, Prosp. Lavrentyev 1, 630090 Novosibirsk, Russian Federation;Institute of Thermophysics SB RAS, Prosp. Lavrentyev 1, 630090 Novosibirsk, Russian Federation;Department of Physics, G?teborg University, 41296 G?teborg, SwedeChemical vapor deposition英文2010-01-05
- Silicon carbonitride (SiCN) films by remote hydrogen microwave plasma CVD from tris(dimethylamino)silane as novel single-source precursor
Wrobel, A.M.;Blaszczyk-Lezak, I.;Uznanski, P.;Glebocki, B.;TQ175Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland;Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, PL-90-363 Lodz, Poland;Centre of Molecular aChemical vapor deposition英文2010-01-05
- Using precursor chemistry to template vanadium oxide for chemical sensing
Beardslee, J.A.;Mebust, A.K.;Chaimowitz, A.S.;Davis-Vanatta, C.R.;Moersch, T.L.;Afridi, M.Y.;Taylor, C.J.;Leonard, H.;TQ175Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, Pomona College, Claremont, CA 91711, United States;Department of Chemistry, PoChemical vapor deposition英文2010-01-05
- Growth of [100]-textured gadolinium nitride films by CVD
Brewer, J.R.;Gernhart, Z.;Liu, H.-Y.;Cheung, C.L.;TQ175Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0304, United States;School of Science, Buena Vista University, Storm Lake, IA 50588, United States;Department of Chemistry, University of Nebraska-Lincoln, Lincoln, Nebraska Chemical vapor deposition英文2010-01-05
- Mass analysis of growth of AL _2O _3 thin films from low-temperature atomic layer deposition on woven cotton
Hojo, D.;Adschiri, T.;TQ175Aluminum oxide;Atomic layer deposition;Conformal coatings;Cotton;Three-dimensional structures;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, Japan;Advanced Institute for Materials Research, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai, 980-8577, JapanChemical vapor deposition英文2010-01-05
- [cis-(1,3-diene) _2W(CO) _2] complexes as MOCVD precursors for the deposition of thin tungsten - Tungsten carbide films
Jipa, I.;Heinemann, F.W.;Schneider, A.;Popovska, N.;Siddiqi, M.A.;Siddiqui, R.A.;Atakan, B.;Marbach, H.;Papp, C.;Steinrück, H.-P.;Zenneck, U.;TQ175Diene complexes;MOCVD;Tungsten;Tungsten carbide;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM), Universit?t Erlangen-Nürnberg, Egerlandstrasse 1, D-91058 Erlangen, Germany;Department Chemie und Pharmazie, Interdisciplinary Center for Molecular Materials (ICMM),Chemical vapor deposition英文2010-01-05
- Improved Additives for High Purity Reduced Cement Castable Systems
Christopher Parr;Genine Assis;Herve Fryda;TQ175原料專門委員会報告集英文2010-01-05
- Direct and Protein-Mediated Cell Attachment on Differently Terminated Nanocrystalline Diamond
Frederik Klauser;Martin Hermann;Doris Steinmuller-Nethl;Oliver Eiter;Alberto Pasquarelli;Erminald Bertel;Thomas Seppi;Peter Lukas;Thomas Lechleitner;TQ175cell adhesion;FBS;HF-CVD;NCD;protein adsorption;Department of Therapeutic Radiology and Oncology, Innsbruck Medical University Anichstr. 35, 6020 Innsbruck (Austria);Department of Therapeutic Radiology and Oncology, Innsbruck Medical University Anichstr. 35, 6020 Innsbruck (Austria);Department of TheraChemical vapor deposition英文2010-01-05
- Comparison of Coupling Methods for Linking Between Reactor and Feature Scales
Jonathan Jilesen;Fue-Sang Lien;TQ175Biomaterials;Calcium lactate;Hydroxyapatite;PP-MOCVD;Trimethyl phosphate;Department of Mechanical Engineering, University of Waterloo 200 University Avenue West, Waterloo, Ontario, N2L 2G1 (Canada);Department of Mechanical Engineering, University of Waterloo 200 University Avenue West, Waterloo, Ontario, N2L 2G1 (Canada)Chemical vapor deposition英文2010-01-05
- Sulfur- and Nitrogen-Doped Titania Biomaterials via APCVD
Charles W. Dunnill;Zoie A. Aiken,;Jonathan Pratten;Ivan P. Parkin;TQ175antimicrobial materials;doped titanium dioxide;thin films;visible light photocatalysts;biomaterials;Centre for Materials Research, Department of Chemistry, University College London;Centre for Materials Research, Department of Chemistry, University College London;Centre for Materials Research, Department of Chemistry, University College London;Centre foChemical vapor deposition英文2010-01-05
- Almatis Group Files Pre-packaged Chapter 11 Cases to Implement Agreed Financial Restructuring
TQ175.7The Refractories Engineer英文2010-01-05
- Atomic layer deposition of gadolinium aluminate using gd (~iprcp)_3, TMA, and O_3 or H_2O
Adelmann, C.;Pierreux, D.;Swerts, J.;Dewulf, D.;Hardy, A.;Tielens, H.;Franquet, A.;Brijs, B.;Moussa, A.;Conard, T.;Van Bael, M.K.;Maes, J.W.;Jurczak, M.;Kittl, J.A..;Van Elshocht, S.;TQ175ALD;Cyclopentadienyl;Gadolinium aluminate;Gadolinium oxide;High-k oxides;Kapeldreef 75, B-3001, Leuven, Belgium;Kapeldreef 75, B-3001, Leuven, Belgium;Kapeldreef 75, B-3001, Leuven, Belgium;Institute for Materials Research, Inorganic and Physical Chemistry, Hasselt University, B-3590, Diepenbeek, Belgium;Institute for MaterialChemical vapor deposition英文2010-01-05
- A New Method for the Growth of Zinc Oxide Nanowires by MOCVD using Oxygen-Donor Adducts of Dimethylzinc
Kate Black;Paul R. Chalker;Anthony C. Jones;Peter J. King;John L. Roberts;Peter N. Heys;TQ175dimethylzinc adducts;liquid injection MOCVD;ZnO nanowires;Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, Merseyside, L69 7ZD (UK);Chemical vapor deposition英文2010-01-05
- Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2
Anthony C. Jones;John Bacsa;Paul R. Chalker;Paul A. Marshall;Hywel O. Davies;Peter N. Heys;Paul O’Brien, Mohammad Afzaal;James Raftery;Gary W. Critchlow;Kate Black;TQ175MOCVD;Titanium 2;5-dimethylpyrrolyl complexes;Titanium dioxide;Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University of Liverpool Liverpool, L69 7ZD (UK);Department of Chemistry, University Chemical vapor deposition英文2010-01-05
- Technology of Mechanization and Automation of Refractory Brick Manufacture
TAKESHI MATSUDA;MASAYA NAKASHIMA;TQ175Journal of the Technical Association of Refractories英文2010-01-05
- Mechanization of Refractory Repair Work with Centrifugal Force Shot Method (Rotary-Shot Method)
HIROSHI IMAGAWA;TADASHI IKEMOTO;KOJI KONO;TQ175Department of Inorganic Materials Research & Development, the Environment and Process Technology Center, the Technical Development Bureau, Nippon Steel Corporation;Department of Inorganic Materials Research & Development, the Environment and Process TechnJournal of the Technical Association of Refractories英文2010-01-05
- Korean Leader Won Over By Dragon
TQ175.7The Refractories Engineer英文2010-01-05
- PRESIDENT'S COLUMN
Peter Rooney;TQ175.7The Refractories Engineer英文2010-01-05
- Pyrotek product solutions and local support assist Portland smelter
TQ175.7The Refractories Engineer英文2010-01-05
- Resin Free Tundish Dry Mix at SSAB Lulea
Steinar Slagnes;Hakan Wahlberg;Odd Westeras;TQ175.7The Refractories Engineer英文2010-01-05
- a-SiOx Coatings Grown on Dental Materials by PECVD: Compositional Analysis and Preliminary Investigation of Biocompatibility Improvements
Pietro Mandracci;Paola Ceruti;Carlo Ricciardi;Federico Mussano;Stefano Carossa;TQ175biomaterials;cytotoxicity;dental materials;EDX;PECVD;silicon oxide;Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio Materiali e Microsistemi), Politecnico di Torino Corso Duca degli Abruzzi 24, I-10129, Torino (Italy);Dipartimento di Scienza dei Materiali e Ingegneria Chimica (Laboratorio MaterialiChemical vapor deposition英文2010-01-05
- Glass furnace refractory supply and developments - 'Interesting times'
Geoff Evans;TQ175.7The Refractories Engineer英文2010-01-05
- The Synthesis of Highly Loaded Cu/Al2O3 and Cu/ZnO/Al2O3 Catalysts by the Two-Step CVD of CuIIdiethylamino-2-propoxide in a Fluidized-Bed Reactor
Michael Becker;Raoul Naumann d‘Alnoncourt;Kevin Kahler;Jelena Sekulic;Roland A. Fischer;Martin Muhler;TQ175copper;fluidized-bed reactor;methanol synthesis;nanocomposites;two-step deposition;zinc oxide;Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Laboratory of Industrial Chemistry, Ruhr-University Bochum D-44780 Bochum, (Germany);Chemical vapor deposition英文2010-01-05